Founded in 2019 and based in Foshan Nanhai, Plutosemi Co., Ltd. specializes in high-performance semiconductor materials. As an industry leader, we offer advanced production capabilities and high-quality products such as silicon wafers and SOI, featuring high precision for diverse applications. Our one-stop services and customized solutions meet specific customer needs. Widely used in China, Europe, and the USA, we maintain strong partnerships with renowned international companies, upholding the philosophy of "Customer First, Quality Foremost".
The company maintains industry-leading standards with certifications in high-performance semiconductor materials R&D, production, and sales, supporting its position as a leader in the semiconductor materials sector.
The suitable thickness of a thermal oxide layer depends on its function, electrical requirements, masking performance, etching conditions, and process temperature. Thin oxide films may be used as gate dielectrics or interface layers, while thicker films can provide stronger insulation, surface protection, or diffusion masking.
Silicon wafer bow is the curvature that develops across a wafer when its two surfaces or internal layers carry uneven stress. It may appear after crystal growth, slicing, grinding, polishing, coating, thermal treatment, or packaging. Excessive bow can affect vacuum chuck contact, lithography focus, wafer bonding, epitaxy, and automated handling.
Silicon wafer flatness is measured by scanning the wafer surface and comparing its height profile with a defined reference plane. The resulting data may be used to calculate global flatness, site flatness, bow, warp, and total thickness variation.
