Founded in 2019 and based in Foshan Nanhai, Plutosemi Co., Ltd. specializes in high-performance semiconductor materials. As an industry leader, we offer advanced production capabilities and high-quality products such as silicon wafers and SOI, featuring high precision for diverse applications. Our one-stop services and customized solutions meet specific customer needs. Widely used in China, Europe, and the USA, we maintain strong partnerships with renowned international companies, upholding the philosophy of "Customer First, Quality Foremost".
The company maintains industry-leading standards with certifications in high-performance semiconductor materials R&D, production, and sales, supporting its position as a leader in the semiconductor materials sector.
Silicon epitaxy service is used when a standard silicon wafer cannot provide the required active layer for device fabrication. Through controlled epitaxial growth, a silicon layer with specific thickness, dopant type, resistivity, and electrical behavior can be formed on the substrate.
Epitaxial wafer is used when a device requires a controlled crystalline layer grown on a substrate. The epitaxial layer can be engineered for thickness, dopant type, resistivity, carrier concentration, and layer structure, allowing the wafer to support diodes, transistors, power devices, IC substrates, image sensors, and specialty semiconductor structures.
SOI wafer quality is affected by layer thickness accuracy, BOX uniformity, interface condition, substrate resistivity, crystal orientation, surface roughness, particles, TTV, bow, warp, and packing cleanliness. Because SOI is a layered engineered substrate, quality cannot be judged only by the appearance of the polished surface.
